Resist stripper for PCB production
EC RESIST-STRIP range includes application-specific, differently formulated strippers (dry films and liquid films) for electronics. They are used in PCB manufacturing and manufacturing IC substrates.
The extremely economical products, EC RESIST-STRIP 20 and 30, are very good strippers for simple to medium-sized technologies.
EC RESIST-STRIP 40 is a stripper for the highest demands. It only minimally swells the resist and consequently removes it from the finest structures (IC) and over-plated areas. The size of the flat can be controlled by temperature and concentration with all the strippers.
EC-RESIST-STRIP 50, on the other hand, is a hybrid stripper. Combined organic and inorganic hydroxides and a pH stabiliser for batch operation ensure a uniform stripping speed over the whole service life.
System profile
- Various systems for various applications (IC substrates and PCB)
- Minimal volume increases of the resist with RESIST-STRIP
- High and constant stripping speed
- TMAH/CHOLINE-free systems
- No copper attack and no tin attack
- Easy AOI testability
- Single dosing component
- Compatible anti-foam agent (EC FOAM-SHUT 100 and 900)
- Adjustable particle size
Application profile
- Low working temperature
EC RESIST-STRIP 20 – INORGANIC RESIST STRIPPER
EC RESIST-STRIP 20 resist stripper has been designed for a variety of different dry films. It is an alkaline concentrate and is suitable for stripping alkali-soluble resists. It is used both in dipping processes and also horizontally. When combined with water, it exhibits an extremely fast stripping rate and does not use toxic organic hydroxides such as TMAH or choline.
EC RESIST-STRIP 30 – ORGANIC RESIST STRIPPER
EC RESIST-STRIP 30 resist stripper was designed for a variety of different dry films and is a concentrate for stripping alkali-soluble resists. The alkaline concentrate has an extremely fast stripping speed when combined with water. It can be applied both by immersion and also horizontally. It contains organic and inorganic hydroxides. EC RESIST-STRIP 30 strips the resist in fine to medium-fine flat areas.
EC RESIST-STRIP 40 – ORGANIC RESIST STRIPPER
EC RESIST-STRIP 40 was developed for a variety of different dry films. It is a concentrate for stripping alkali-soluble resists. The alkaline concentrate has an extremely fast stripping speed when combined with water. It can be applied both by immersion and also horizontally. EC RESIST-STRIP 40 only contains organic hydroxides and strips the resist in fine particles.
EC RESIST-STRIP 50 – stabilised RESIST STRIPPER
EC RESIST-STRIP 50 has been developed to strip alkali-soluble resists. It can be used in immersion processes and also horizontally. The alkaline concentrate has an extremely fast stripping speed when combined with water. It can be applied both by immersion and also horizontally. EC RESIST-STRIP 50 resist stripper has been designed for a variety of different dry films. EC RESIST-STRIP 50 contains organic and inorganic hydroxides. EC RESIST-STRIP 50 strips the resist in fine to medium-fine flat areas. EC RESIST-STRIP 50 is pH-stabilised.
EC RESIST-STRIP 90 – High-performance RESIST STRIPPER
EC RESIST-STRIP 90 was developed to strip alkali-soluble resists. It can be used in immersion processes and also horizontally. The alkaline concentrate, when combined with water, has the quickest stripping speed of all EC RESIST-STRIP strippers. EC RESIST-STRIP 90 can compensate for system engineering deficiencies such as filtration, separation, spray pattern and spray pressure.
